Nanophotolithographie en champ proche

BIBLIOGRAPHIE

• (1) - Bulletin MRS (Materials Research Society) -   Fabrication of sub-45 nm structures for the next generation of devices.  -  Vol. 30, n˚ 12, déc. 2005.

• (2) - RONSE (K.) -   Optical lithography – a historical perspective.  -  C. R. Physique, doi : 10.1016/j.chry.2006.10.007 (2006).

• (3) - SWITKES (M.), ROTHSCHILD (M.), KUNZ (R.R.), BAEK (S.-Y.), COLES (D.), YEUNG (M.) -   Immersion lithography : Beyond the 65 nm node with optics.  -  Microlithography World, p. 4, mai 2003.

• (4) - COURJON (D.) -   Near-field microscopy and near-field optics.  -  Imperial College Press, Londre (2003).

• (5) - NOVOTNY (L.), HECHT (B.) -   Principles of Nanooptics.  -  Cambridge Press (2007).

• (6) - LOURTIOZ (J.M.), TCHELNOKOV (A.) -   Nanophotonique et Micro-Nanotechnologies.  -  Techniques de l'ingénieur. Nanotechnologies...